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#	Item
611	Success Story Synopsys and NXP Multicore Optimization Technology in Platform Architect Enables NXP to Analyze System-Level Performance and Reduce Cycle Time Add to Reading List Source URL: www.synopsys.com Language: English Synopsys Program optimization Infrastructure optimization NXP Semiconductors Digital Audio Broadcasting Electronic engineering Electronic design automation SystemC
612	Datasheet Solutions for DO-254 Overview `` Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2015-03-10 22:15:24 Electronic design Logic design Integrated circuits Synopsys Hardware description language Logic synthesis Logic simulation Integrated circuit design High-level synthesis Electronic engineering Digital electronics Electronic design automation
613	Success Story Synopsys and Ricoh Ricoh Optimizes New Multi-Function Printer SoC Architecture with Synopsys Platform Architect MCO Add to Reading List Source URL: www.synopsys.com Language: English Hardware verification languages Hillsboro Oregon Synopsys High-level synthesis SystemC System on a chip Logic synthesis Ricoh Electronic engineering Electronic design automation Electronic design
614	Datasheet CATS The MDP Standard Overview Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:34:40 Mask data preparation Digital electronics Synopsys GDSII Optical proximity correction Mask inspection Electronic design Electronic engineering Electronic design automation CATS
615	Datasheet PSM Create and PSM Check Alt-PSM technology for tighter control of chip performance and increased yield Product Overview Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:34:24 Resolution enhancement technologies Integrated circuits Video game magazines Integrated circuit design Phase-shift mask Synopsys PSM pistol PlayStation: The Official Magazine Optical proximity correction Electronic engineering Electronic design automation Electronics
616	Datasheet Sentaurus Lithography Predictive Modeling of Lithographic Processes Overview Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:34:17 Computational lithography Extreme ultraviolet lithography Multiple patterning Photolithography Immersion lithography Optical proximity correction Lithography Resist Electron beam lithography Materials science Technology Microtechnology
617	Datasheet Proteus MetroKit Efficient metrology interfacing Overview Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:34:24 Metrology Hillsboro Oregon Synopsys Calibration Electron microscope Scanning electron microscope Scientific method Electron microscopy Science
618	Datasheet IC WorkBench Edit/View Plus High Speed Layout Visualization Overview Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:34:23 GDSII Synopsys Electronic design automation Hierarchy User interface Workbench Genera EDA database Software Computing System software
619	Photronics Relies on Synopsys for Photomask Manufacturing Solutions “We selected Synopsys to be our primary EDA partner because they are the only EDA company that delivers the complete range of design solutions we need Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:34:10 CATS Photomask Numerical Technologies Computational lithography Electronic engineering Hillsboro Oregon Synopsys
620	Technical Backgrounder 定点算法设计流程 July[removed]Author Add to Reading List Source URL: www.synopsys.com Language: Chinese

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