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Phase-shift mask
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#	Item
1	Datasheet PSM Create and PSM Check Alt-PSM technology for tighter control of chip performance and increased yield Product Overview Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:34:24 Resolution enhancement technologies Integrated circuits Video game magazines Integrated circuit design Phase-shift mask Synopsys PSM pistol PlayStation: The Official Magazine Optical proximity correction Electronic engineering Electronic design automation Electronics
2	Fabrication of phase shifting masks with TM nanoimprint lithography for PHABLE photolithography Christian Daisa, Francis Clubea,b, Harun H. Solaka, Konrad Vogelsangb, Helmut Schiftb a Eulitha AG, 5232 Villigen PSI, Switz Add to Reading List Source URL: www.eulitha.com Language: English - Date: 2014-05-05 05:15:37 Semiconductor device fabrication Chemistry Nanoimprint lithography Photolithography Photoresist Phase-shift mask Resist Etching Talbot effect Materials science Microtechnology Technology
3	Datasheet PSM Create and PSM Check Alt-PSM technology for tighter control of chip performance and increased yield Product Overview Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:34:24 Resolution enhancement technologies Integrated circuits Video game magazines Integrated circuit design Phase-shift mask Synopsys PSM pistol PlayStation: The Official Magazine Optical proximity correction Electronic engineering Electronic design automation Electronics
4 $Technology / Extreme ultraviolet lithography / Photomask / Microtechnology / Phase-shift mask / Immersion lithography / Diffraction / Camera lens / Reticle / Materials science / Optics / Physics$	Photomask BACUS—The international technical group of SPIE dedicated to the advancement of photomask technology. Add to Reading List Source URL: spie.org Language: English - Date: 2014-01-16 09:38:11 Technology Extreme ultraviolet lithography Photomask Microtechnology Phase-shift mask Immersion lithography Diffraction Camera lens Reticle Materials science Optics Physics
5 $Chemistry / Laboratory techniques / Phase-shift mask / Microscopy / Refractive index / Off-axis illumination / Diffraction / Image scanner / Physics / Optics / Science$	Novel solution for in-die phase control under scanner equivalent optical settings for 45nm node and below Sascha Perlitz, Ute Buttgereit, Thomas Scherübl, Dirk Seidel Add to Reading List Source URL: www.zeiss.com Language: English - Date: 2010-10-16 20:08:49 Chemistry Laboratory techniques Phase-shift mask Microscopy Refractive index Off-axis illumination Diffraction Image scanner Physics Optics Science

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