Dopant

Results: 74



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31(Example of cover and title page)

(Example of cover and title page)

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Source URL: www.li.mahidol.ac.th

Language: English - Date: 2008-10-01 04:14:54
32Quantum corrections to the 'atomistic' MOSFET simulation - Computational Electronics, 2000. Book of Abstracts. IWCE Glasgow[removed]7th International Workshop

Quantum corrections to the 'atomistic' MOSFET simulation - Computational Electronics, 2000. Book of Abstracts. IWCE Glasgow[removed]7th International Workshop

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Source URL: eprints.gla.ac.uk

Language: English - Date: 2011-08-15 10:02:41
33ARTICLE  Characterization of Impurity Doping and Stress in Si/Ge and Ge/Si CoreShell Nanowires Naoki Fukata,†,* Masanori Mitome,† Takashi Sekiguchi,† Yoshio Bando,† Melanie Kirkham,‡,#

ARTICLE Characterization of Impurity Doping and Stress in Si/Ge and Ge/Si CoreShell Nanowires Naoki Fukata,†,* Masanori Mitome,† Takashi Sekiguchi,† Yoshio Bando,† Melanie Kirkham,‡,#

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Source URL: www.nanoscience.gatech.edu

Language: English - Date: 2012-09-26 10:09:19
34LBNL-6174E  Dopant-induced band filling and bandgap renormalization in CdO:In films Yuankun Zhu Harbin Institute of Technology

LBNL-6174E Dopant-induced band filling and bandgap renormalization in CdO:In films Yuankun Zhu Harbin Institute of Technology

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Source URL: eetd.lbl.gov

Language: English - Date: 2014-12-11 20:13:50
35D:/Daten/Dr. Arbeit/Veroeffentlichungen/paper_opt_mat_exp/final_tex/Ho_LuO_Koopmann_revised.dvi

D:/Daten/Dr. Arbeit/Veroeffentlichungen/paper_opt_mat_exp/final_tex/Ho_LuO_Koopmann_revised.dvi

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Source URL: www.mirsurg.eu

Language: English - Date: 2012-09-27 05:37:49
36doi:[removed]j.physc[removed]

doi:[removed]j.physc[removed]

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Source URL: users.physik.fu-berlin.de

Language: English - Date: 2007-10-04 10:21:35
37948  OPTICS LETTERS / Vol. 36, No. 6 / March 15, 2011 Efficient diode-pumped laser operation of Tm:Lu2O3 around 2 μm

948 OPTICS LETTERS / Vol. 36, No. 6 / March 15, 2011 Efficient diode-pumped laser operation of Tm:Lu2O3 around 2 μm

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Source URL: www.mirsurg.eu

Language: English - Date: 2012-09-27 05:37:52
38Manufacturing Rev. 2014, 1, 3  S. Pal et al., Published by EDP Sciences, 2014 DOI: [removed]mfreview[removed]Available online at: http://mfr.edp-open.org

Manufacturing Rev. 2014, 1, 3  S. Pal et al., Published by EDP Sciences, 2014 DOI: [removed]mfreview[removed]Available online at: http://mfr.edp-open.org

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Source URL: mfr.edp-open.org

Language: English
39SLS Symposium on Imaging Tuesday, July 8, [removed]:00 to 12:15, WBGB[removed]:00 Electronically active dopant profiling of power semiconductor structures by complementary Scanning Probe Microscopy (SPM)

SLS Symposium on Imaging Tuesday, July 8, [removed]:00 to 12:15, WBGB[removed]:00 Electronically active dopant profiling of power semiconductor structures by complementary Scanning Probe Microscopy (SPM)

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Source URL: www.psi.ch

Language: English - Date: 2015-02-03 08:51:12
40Stealthy Dopant-Level Hardware Trojans Georg T. Becker1, Francesco Regazzoni2, Christof Paar1,3, and Wayne P. Burleson1 1University

Stealthy Dopant-Level Hardware Trojans Georg T. Becker1, Francesco Regazzoni2, Christof Paar1,3, and Wayne P. Burleson1 1University

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Source URL: www.chesworkshop.org

Language: English - Date: 2013-09-30 16:28:19