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90 nanometer
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1	EMOTIONENGINE® AND GRAPHICS SYNTHESIZER USED IN THE CORE OF PLAYSTATION® BECOME ONE CHIP PlayStation®2 CPU and Graphics Chip Becomes One with 90 Nanometer Process Tokyo, April 21, 2003 – Sony Computer Entertainment Add to Reading List Source URL: www.scei.co.jp Language: English - Date: 2009-10-28 04:21:55 Technology Semiconductor companies Computer memory Sony Dynamic random-access memory Semiconductor device fabrication Semiconductor fabrication plant Xenon PlayStation Electronics Video game development
2	Chartered Launches 0.13-Micron, 0.11-Micron and 90-Nanometer Processes at 300-mm Fab Add to Reading List Source URL: phys.org Language: English - Date: 2015-02-10 17:04:46 Electronics Semiconductor fabrication plant Silicon on insulator Chartered Semiconductor Manufacturing Wafer Semiconductor companies GlobalFoundries Semiconductor device fabrication Microtechnology Materials science
3	INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS[removed]EDITION Add to Reading List Source URL: public.itrs.net Language: English - Date: 2014-03-27 14:06:28 International Technology Roadmap for Semiconductors Integrated circuit Electronic engineering 16 nanometer 180 nanometer 90 nanometer 22 nanometer Microtechnology Low-k dielectric Materials science
4	INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS[removed]EDITION Add to Reading List Source URL: www.itrs.net Language: English - Date: 2014-03-27 14:06:28 International Technology Roadmap for Semiconductors Integrated circuit Electronic engineering 16 nanometer 180 nanometer 90 nanometer 22 nanometer Microtechnology Low-k dielectric Materials science
5	High-‐frequency poten2al for Future Silicon CMOS and BiCMOS technologies Jack Pekarik STSM, IBM SiGe Technology Development Chair, RFAMS Wo Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:14:17 Logic families Digital electronics Electronic design BiCMOS MOSFET Silicon-germanium CMOS 65 nanometer 90 nanometer Electronic engineering Electronics Integrated circuits
6	PROJECT PROFILE T406: Extreme UV consortium for imaging technology (ExCITe) PROCESS EQUIPMENT Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:37:16 Microtechnology Photolithography Extreme ultraviolet Resist Ultraviolet 90 nanometer 45 nanometer Materials science Electromagnetic radiation Extreme ultraviolet lithography
7	PROJECT PROFILE 2T103: Integration of 45 nm CMOS technology (FOREMOST) TECHNOLOGY PLATFORM FOR NEXT-GENERATION Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:35:54 Integrated circuits Digital electronics Logic families 45 nanometer CMOS 65 nanometer 90 nanometer Semiconductor device fabrication IMEC Electronic engineering Electronics Materials science
8	PROJECT RESULT IC technology integration T207: 65 nm CMOS process in 300 mm wafer Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:39:40 22 nanometer IMEC 45 nanometer Photolithography 65 nanometer Integrated circuit Wafer STMicroelectronics 90 nanometer Materials science Technology Microtechnology
9	PROJECT PROFILE T207: 65nm CMOS process in 300mm wafers (65nm CMOS300) IC TECHNOLOGY INTEGRATION Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:37:02 Integrated circuits IMEC Leuven STMicroelectronics 90 nanometer Crolles Photolithography International Technology Roadmap for Semiconductors CMOS Electronic engineering Technology Electronics
10	EUV Lithography at Insertion and Beyond Add to Reading List Source URL: www.euvlitho.com Language: English - Date: 2012-07-01 20:01:42 Electronics 32 nanometer 45 nanometer Extreme ultraviolet Intel 90 nanometer 65 nanometer Extreme ultraviolet lithography Electronic engineering Technology

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