Normal-incidence efficiencies of multilayer-coated laminar gratings for the Extreme-Ultraviolet Imaging Spectrometer on the Solar-B mission John F. Seely, Charles M. Brown, David L. Windt, Soizik Donguy, and Benjawan Kjo

Source URL: www.rxollc.com

Stability of extreme ultraviolet multilayer coatings to low energy proton bombardment M.G. Pelizzo,1,2,* Alain Jody Corso,1,2 Paola Zuppella,1,2 D.L. Windt,3 G. Mattei,4 P. Nicolosi1,2 1

Source URL: www.rxollc.com

Extract from Radiation Sources Laboratory 2012 Activity Report 4.1 Short-wavelength Sources and Applications In the extreme ultraviolet (EUV) spectral region (20 eV - 280eV) laser-plasma and

Source URL: www.frascati.enea.it

PHYSIKALISCHES KOLLOQUIUM ANTRITTSVORLESUNG AM 9. JANUAR 2017 UM 17 UHR C.T. IM GROßEN HÖRSAAL ATTOSECOND AND INTENSE EXTREME ULTRAVIOLET PULSES:

Source URL: www.mathphys.uni-freiburg.de

Ionization and dissociation dynamics of vinyl bromide probed by femtosecond extreme ultraviolet transient absorption spectroscopy Ming-Fu Lin, Daniel M. Neumark, Oliver Gessner, and Stephen R. Leone Citation: The Journal

Source URL: bromine.cchem.berkeley.edu

This article was downloaded by: [University of California, Berkeley] On: 26 August 2015, At: 10:09 Publisher: Taylor & Francis Informa Ltd Registered in England and Wales Registered Number: Registered office: 5 H

Source URL: bromine.cchem.berkeley.edu

• Chemistry
• Physics
• Emission spectroscopy
• Atomic physics
• Extreme ultraviolet
• Condensed matter physics
• Spectroscopy
• X-ray photoelectron spectroscopy
• Photoemission spectroscopy
• Rydberg atom
• Helium
• Excited state

FRAUNHOFER INSTI TUTE FOR I NTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB TECHNOLOGY S IMULATION THE TECHNOLOGY SIMULATION DEPARTMENT

Source URL: www.iisb.fraunhofer.de

• Engineering
• Process engineering
• Electronic design automation
• Semiconductor device fabrication
• Simulation software
• Simulation
• Process
• Resist
• Modeling and simulation
• Semiconductor
• Semiconductor process simulation
• Extreme ultraviolet lithography

Polymer–2384 www.elsevier.com/locate/polymer Pattern formation in polymer films under the mask Juan Peng, Yanchun Han*, Yuming Yang, Binyao Li State Key Laboratory of Polymer Physics and Chemistry, Chang

Source URL: www.polymer.fudan.edu.cn

• Chemistry
• Optical materials
• Electronics
• Microtechnology
• Polymer chemistry
• Transparent materials
• Polymer
• Extreme ultraviolet lithography
• Poly
• Photolithography
• Dewetting
• OLED

Chapter 4 Frequency Tunable Attosecond Apparatus Hiroki Mashiko, M. Justine Bell, Annelise R. Beck, Daniel M. Neumark, and Stephen R. Leone

Source URL: bromine.cchem.berkeley.edu

• Optics
• Electromagnetic radiation
• Laser science
• Nonlinear optics
• Physics
• Interferometry
• Ultrashort pulse
• Extreme ultraviolet
• Laser
• Ultraviolet
• Coherence
• Ultrafast laser spectroscopy

Attosecond transient absorption probing of electronic superpositions of bound states in neon: detection of quantum beats

Source URL: bromine.cchem.berkeley.edu

• Optics
• Spectroscopy
• Chemistry
• Electromagnetic radiation
• Laser science
• Nonlinear optics
• Ultrafast laser spectroscopy
• Mode-locking
• High harmonic generation
• Ultrashort pulse
• Absorption spectroscopy
• Extreme ultraviolet