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X-ray lithography
Results: 49

#	Item
1	Soft X-Ray Lithography for High-Aspect Ratio Sub-Micrometer Structures S. Lemkea, J. Goettertb, T. Holubeka, B. Löchela, I. Rudolpha and T. Seligera a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH, Add to Reading List Source URL: camd.lsu.edu - Date: 2012-08-02 10:08:48*
2	Heat Load Experiments at CAMD and CLS D. Yemane1, S. Achenbach2, J. Goettert1, R. Guntaka3, D. Haluzan2, K. Nandakumar3, V. Singh1, V. Subramanian2, G. Wells2 1 LSU Center for Advanced Microstructures and Devices (CAMD), Add to Reading List Source URL: www.camd.lsu.edu Language: English - Date: 2012-07-25 17:48:50 Chemistry Materials science Physics Matter Microtechnology LIGA X-ray lithography Photoresist Canadian Light Source Resist Beamline Poly
3	2007 Annual Report nasdaq \| rtec DE A R FE L LOW SH A R EHOL DER S The past year was a challenging one, as semiconductor device manufacturers over-estimated demand, particularly for Add to Reading List Source URL: www.tamartechnology.com Language: English - Date: 2012-05-14 11:44:47 Semiconductor device fabrication Rudolph Technologies Inc. Electromagnetic radiation Business Electronic engineering Ellipsometry Wafer Reliability Immersion lithography Automated X-ray inspection Reflectometry KLA-Tencor
4	Combinatorial Multilevel Mold Insert Using Micromachining and X-ray Lithography V. Singh1, J. Goettert1, O. Jinka1,2,* 1 Center for Advanced Microstructures and Devices (CAMD) Add to Reading List Source URL: camd.lsu.edu Language: English - Date: 2012-07-31 11:19:10 Chemistry Microtechnology Materials science Engineering Polymers LIGA Semiconductor device fabrication Microelectromechanical systems Photoresist Photolithography SU-8 photoresist Poly
5	Heat Load Experiments at CAMD and CLS D. Yemane1, S. Achenbach2, J. Goettert1, R. Guntaka3, D. Haluzan2, K. Nandakumar3, V. Singh1, V. Subramanian2, G. Wells2 1 LSU Center for Advanced Microstructures and Devices (CAMD), Add to Reading List Source URL: camd.lsu.edu Language: English - Date: 2012-07-25 17:48:50 Chemistry Materials science Physics Matter Microtechnology LIGA X-ray lithography Photoresist Canadian Light Source Resist Beamline Poly
6	Combinatorial Multilevel Mold Insert Using Micromachining and X-ray Lithography V. Singh1, J. Goettert1, O. Jinka1,2,* 1 Center for Advanced Microstructures and Devices (CAMD) Add to Reading List Source URL: www.camd.lsu.edu Language: English - Date: 2012-07-31 11:19:10 Chemistry Microtechnology Materials science Polymers LIGA Semiconductor device fabrication Microelectromechanical systems Photoresist Photolithography SU-8 photoresist Poly Resist
7	Negative Resists for Ultra-Tall, High Aspect Ratio Microstructures S. Lemkea, P. Goetterta, I. Rudolpha, J. Goettertb,, B. Löchela a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH, Institute for Nanom Add to Reading List Source URL: www.camd.lsu.edu Language: English* - Date: 2012-08-02 10:05:16 Materials science Microtechnology Polymers LIGA Photoresist SU-8 photoresist X-ray lithography Poly Resist X-ray Microelectromechanical systems HARMST
8	Soft X-Ray Lithography for High-Aspect Ratio Sub-Micrometer Structures S. Lemkea, J. Goettertb, T. Holubeka, B. Löchela, I. Rudolpha and T. Seligera a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH, Add to Reading List Source URL: www.camd.lsu.edu Language: English* - Date: 2012-08-02 10:08:48 Materials science Microtechnology Polymers Semiconductor device fabrication X-ray lithography Photolithography LIGA SU-8 photoresist Photoresist Nanolithography Beamline Electron-beam lithography
9	FIRST CALL FOR PAPERS We are inviting presentations and poster papers for the 2016 International Workshop on EUV Lithography, to be held June 13-16, 2016 at The Center for X-ray Optics (CXRO) at Lawrence Berkeley Nationa Add to Reading List Source URL: www.euvlitho.com Language: English - Date: 2016-02-11 21:41:26
10	grating parameters X-ray lithography laserlithography Add to Reading List Source URL: www.micro-works.de - Date: 2014-01-17 04:10:29