Negative Resists for Ultra-Tall, High Aspect Ratio Microstructures S. Lemkea, P. Goetterta, I. Rudolpha, J. Goettertb,*, B. Löchela a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH, Institute for Nanom

Source URL: www.camd.lsu.edu

• Materials science
• Microtechnology
• Polymers
• LIGA
• Photoresist
• SU-8 photoresist
• X-ray lithography
• Poly
• Resist
• X-ray
• Microelectromechanical systems
• HARMST