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#	Item
381	Microsoft Word - Arasan_eMMC5.1_Febdocx Add to Reading List Source URL: www.avant-tek.com Language: English - Date: 2015-03-04 19:41:26 Electronic design Electronic design automation Logic design Semiconductor intellectual property core Linux-based devices
382	Journal of Undergraduate Research 6, Atomic Layer Deposition of Cerium Oxide for Potential Use in Solid Oxide Fuel Cells R.R. Essex Department of Chemical Engineering, Rose-Hulman Institute of Technology, T Add to Reading List Source URL: jur.phy.uic.edu Language: English - Date: 2013-04-17 12:26:28 Fuel cells Thin film deposition Semiconductor device fabrication Oxides Atomic layer deposition Thin films Solid oxide fuel cell Cerium(IV) oxide Proton exchange membrane fuel cell Thin film Battery Cerium(III) oxide
383	amerlux_logo_b&w 0511.pdf Add to Reading List Source URL: www.amerlux.com Language: English - Date: 2016-06-01 13:35:35 Light-emitting diodes Energy-saving lighting Gas discharge lamps Semiconductor devices Lighting Solid-state lighting LED lamp Philips Compact fluorescent lamp Osram Opto Semiconductors GmbH Electrodeless lamp Incandescent light bulb
384	A Demonstration of Broadband RF Sensing: Empirical Polysilicon Etch Rate Estimation in a Lam 9400 Etch Tool Craig Garvin and J. W. Grizzle Department of Electrical Engineering and Computer Science, University of Michigan Add to Reading List Source URL: web.eecs.umich.edu Language: English - Date: 2016-04-25 13:15:11 Semiconductor device fabrication Analog circuits Plasma processing Electronic filter topology Microtechnology Reactive-ion etching Crystal oscillator Etching Plasma etching RLC circuit Plasma Q factor
385	Microsoft Word - cp1608_04_ClarificationForScanSpotPositionMap.doc Add to Reading List Source URL: dicom.nema.org Language: English - Date: 2016-06-14 13:03:42 Medical physics Semiconductor device fabrication Radiobiology Radiation therapy Radioactivity Ion beam
386	The 19th International Conference on Crystal Growth and Epitaxy (ICCGE-19) Keystone, Colorado, U.S.A. * July 28–August 2, 2019 and th The 17 International Summer School on Crystal Growth (ISSCG-17) Add to Reading List Source URL: www.crystalgrowth.org Language: English - Date: 2016-07-21 08:38:28 Semiconductor device fabrication Thin film deposition Crystallography Epitaxy Crystal
387	Reverse engineering a Qualcomm baseband Guillaume Delugr´e Sogeti / ESEC R&D guillaume(at)security-labs.org Add to Reading List Source URL: esec-lab.sogeti.com Language: English - Date: 2016-07-01 12:08:46 Fabless semiconductor companies Baseband processor Qualcomm Baseband IPhone 3GS MediaTek OsmocomBB ARM Holdings
388	Compensation for transient chamber wall condition using realtime plasma density feedback control in an inductively coupled plasma etcher Pete I. Klimecky, J. W. Grizzle, and Fred L. Terry, Jr. Department of Electrical En Add to Reading List Source URL: web.eecs.umich.edu Language: English - Date: 2016-04-25 13:15:14 Semiconductor device fabrication Plasma processing Plasma physics Microtechnology Measuring instruments Plasma Reactive-ion etching Langmuir probe Crystal oscillator Etching Microwave Plasma diagnostics
389	THE FUTURE OF STORAGE Toshiba’s View on Trends to 2020 Toshiba Electronics Europe GmbH March 2016, WHD © 2015 Add to Reading List Source URL: www.whd.global Language: English - Date: 2016-03-30 07:38:30 Non-volatile memory Computer memory Computer storage devices Computer storage media Semiconductor companies Solid-state drive Flash memory IOPS Toshiba Magnetoresistive random-access memory Dynamic random-access memory Phase-change memory
390	Produktblatt_Cleaning2016.indd Add to Reading List Source URL: www.ipms.fraunhofer.de Language: English - Date: 2016-06-30 03:44:06 Semiconductor device fabrication Wafer KLA-Tencor Fraunhofer Society

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