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Plasma etching
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#	Item
1	Application Note Xe plasma FIB (i-FIB) Delayering technology using water as Gas-Assisting Etching Add to Reading List Source URL: www.orsayphysics.com Language: English - Date: 2016-06-28 10:32:08
2	Control of Ion Energy in a Capacitively Coupled Reactive Ion Etcher H. M. Park , C. Garvin, D. S. Grimard and J. W. Grizzle Electronics Manufacturing and Control Systems Laboratory, Dept. of Electrical Engineering and C Add to Reading List Source URL: web.eecs.umich.edu Language: English - Date: 2016-04-25 13:15:14 Semiconductor device fabrication Plasma physics Plasma processing Physics Manufacturing Electromagnetism Reactive-ion etching Plasma Langmuir probe Etching Capacitor Capacitively coupled plasma
3	A Demonstration of Broadband RF Sensing: Empirical Polysilicon Etch Rate Estimation in a Lam 9400 Etch Tool Craig Garvin and J. W. Grizzle Department of Electrical Engineering and Computer Science, University of Michigan Add to Reading List Source URL: web.eecs.umich.edu Language: English - Date: 2016-04-25 13:15:11 Semiconductor device fabrication Analog circuits Plasma processing Electronic filter topology Microtechnology Reactive-ion etching Crystal oscillator Etching Plasma etching RLC circuit Plasma Q factor
4	Compensation for transient chamber wall condition using realtime plasma density feedback control in an inductively coupled plasma etcher Pete I. Klimecky, J. W. Grizzle, and Fred L. Terry, Jr. Department of Electrical En Add to Reading List Source URL: web.eecs.umich.edu Language: English - Date: 2016-04-25 13:15:14 Semiconductor device fabrication Plasma processing Plasma physics Microtechnology Measuring instruments Plasma Reactive-ion etching Langmuir probe Crystal oscillator Etching Microwave Plasma diagnostics
5	High-Aspect Ratio Deep Sub-Micron α-Si Gate Etch Process Control H.-M. Park, T. L. Brock, D. Grimard, J. W. Grizzle and F. L. Terry, Jr University of Michigan 195th Spring Meeting of ECS Add to Reading List Source URL: web.eecs.umich.edu Language: English - Date: 2016-04-25 13:15:12 Semiconductor device fabrication Microtechnology Etching Plasma processing Chemical milling Isotropic etching Plasma etching Microelectromechanical systems Buffered oxide etch
6	WALL STATE EFFECTS ON Cl2 POLY-SI RIE: REAL-TIME MEASUREMENTS, MECHANISMS, AND FEEDBACK CONTROL SOLUTIONS Pete I. Klimecky, Jessy W. Grizzle, and Fred L. Terry, Jr. University of Michigan/EECS Dept. , RmBeal A Add to Reading List Source URL: web.eecs.umich.edu Language: English - Date: 2016-04-25 13:15:14 Semiconductor device fabrication Etching Microtechnology Semiconductors Reactive-ion etching Chemical milling Plasma Crystal oscillator Lam Research Gas Isotropic etching
7	FLARION Series Plasma Reactors The FLARION series plasma reactors are custom designed for plasma-enhanced chemical vapour deposition (PECVD), plasma etching (PE), reactive or deep reactive ion etching (RIE, DRIE), or su Add to Reading List Source URL: www.plasmionique.com Language: English - Date: 2016-05-17 17:54:17
8	Tin removal from extreme ultraviolet collector optics by inductively coupled plasma reactive ion etching H. Shin,a兲 S. N. Srivastava, and D. N. Ruzicb兲 Center for Plasma Material Interactions, University of Illinois Add to Reading List Source URL: cpmi.illinois.edu Language: English - Date: 2015-04-22 08:46:31
9	Environmentally Friendly Low Pressure Plasma Nanocoatings for Headsets Eva Rogge, MSc Nano4SME workshop Add to Reading List Source URL: www.minacned.nl Language: English - Date: 2014-06-05 03:45:48 Materials science Semiconductor device fabrication Plasma Perfluorooctanoic acid Coating Perfluorooctanesulfonic acid Etching Chemistry Perfluorinated compounds Plasma processing
10	Progress in NUCLEAR SCIENCE and TECHNOLOGY, Vol. 1, pImprovement of Crystal Quality of a Homoepitaxially Grown Diamond Layer Using Plasma Etching Treatment for a Diamond Substrate Yuta KONNO1, Junichi H Add to Reading List Source URL: www.aesj.or.jp - Date: 2011-03-15 04:26:49*