Reactive-ion etching

Results: 96



#Item
1NANO LETTERS Three-Dimensional Nanostructures Formed by Single Step, Two-Photon Exposures through Elastomeric Penrose

NANO LETTERS Three-Dimensional Nanostructures Formed by Single Step, Two-Photon Exposures through Elastomeric Penrose

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Source URL: rogers.matse.illinois.edu

Language: English - Date: 2008-08-15 17:59:48
2Control of Ion Energy in a Capacitively Coupled Reactive Ion Etcher H. M. Park , C. Garvin, D. S. Grimard and J. W. Grizzle Electronics Manufacturing and Control Systems Laboratory, Dept. of Electrical Engineering and C

Control of Ion Energy in a Capacitively Coupled Reactive Ion Etcher H. M. Park , C. Garvin, D. S. Grimard and J. W. Grizzle Electronics Manufacturing and Control Systems Laboratory, Dept. of Electrical Engineering and C

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Source URL: web.eecs.umich.edu

Language: English - Date: 2016-04-25 13:15:14
3Product Spotlight  SOL9350 Series New P+ Contact Paste for N-type Cells N-type cell designs have demonstrated high efficiencies for

Product Spotlight SOL9350 Series New P+ Contact Paste for N-type Cells N-type cell designs have demonstrated high efficiencies for

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Source URL: www.heraeus.com

Language: English - Date: 2016-08-11 05:24:23
4A Demonstration of Broadband RF Sensing: Empirical Polysilicon Etch Rate Estimation in a Lam 9400 Etch Tool Craig Garvin and J. W. Grizzle Department of Electrical Engineering and Computer Science, University of Michigan

A Demonstration of Broadband RF Sensing: Empirical Polysilicon Etch Rate Estimation in a Lam 9400 Etch Tool Craig Garvin and J. W. Grizzle Department of Electrical Engineering and Computer Science, University of Michigan

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Source URL: web.eecs.umich.edu

Language: English - Date: 2016-04-25 13:15:11
5Compensation for transient chamber wall condition using realtime plasma density feedback control in an inductively coupled plasma etcher Pete I. Klimecky, J. W. Grizzle, and Fred L. Terry, Jr. Department of Electrical En

Compensation for transient chamber wall condition using realtime plasma density feedback control in an inductively coupled plasma etcher Pete I. Klimecky, J. W. Grizzle, and Fred L. Terry, Jr. Department of Electrical En

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Source URL: web.eecs.umich.edu

Language: English - Date: 2016-04-25 13:15:14
6Fraunhofer  IMS F RAU N HOF E R I NST I T U T E F O R M IC RO E L EC T RO N I C C I RCU I T S A N D SYS T E MS I MS

Fraunhofer IMS F RAU N HOF E R I NST I T U T E F O R M IC RO E L EC T RO N I C C I RCU I T S A N D SYS T E MS I MS

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Source URL: www.ims.fraunhofer.de

Language: English - Date: 2016-08-18 14:28:44
7WALL STATE EFFECTS ON Cl2 POLY-SI RIE: REAL-TIME MEASUREMENTS, MECHANISMS, AND FEEDBACK CONTROL SOLUTIONS Pete I. Klimecky, Jessy W. Grizzle, and Fred L. Terry, Jr. University of Michigan/EECS Dept. , RmBeal A

WALL STATE EFFECTS ON Cl2 POLY-SI RIE: REAL-TIME MEASUREMENTS, MECHANISMS, AND FEEDBACK CONTROL SOLUTIONS Pete I. Klimecky, Jessy W. Grizzle, and Fred L. Terry, Jr. University of Michigan/EECS Dept. , RmBeal A

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Source URL: web.eecs.umich.edu

Language: English - Date: 2016-04-25 13:15:14
8

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Source URL: www.europractice.stfc.ac.uk

Language: English - Date: 2011-04-22 07:39:08
9FRAUNHOFER INSTITUTE FOR PHOTONIC MICROSYSTEMS IPMS CENTER NANOELECTRONIC TECHNOLOGIES (CNT) 1  2

FRAUNHOFER INSTITUTE FOR PHOTONIC MICROSYSTEMS IPMS CENTER NANOELECTRONIC TECHNOLOGIES (CNT) 1 2

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Source URL: www.screening-fab.com

Language: English - Date: 2016-02-05 07:17:40
10MEMS, Field-Emitter, Thermal, Fluidic Devices A Tabletop Deep Reactive Ion Etching System for MEMS Development and Production................................................. 101 A Miniature MEMS Vacuum Pump with Curved

MEMS, Field-Emitter, Thermal, Fluidic Devices A Tabletop Deep Reactive Ion Etching System for MEMS Development and Production................................................. 101 A Miniature MEMS Vacuum Pump with Curved

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Source URL: www-mtl.mit.edu

Language: English - Date: 2015-07-31 15:51:13