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Thin film deposition / Industrial gases / Semiconductor growth / Semiconductor device fabrication / Molecular beam epitaxy / Gallium arsenide / Liquid nitrogen / High-electron-mobility transistor / Water cooling / Epitaxy / Nitrogen / Metalorganic vapour phase epitaxy
Date: 2009-05-08 06:40:08
Thin film deposition
Industrial gases
Semiconductor growth
Semiconductor device fabrication
Molecular beam epitaxy
Gallium arsenide
Liquid nitrogen
High-electron-mobility transistor
Water cooling
Epitaxy
Nitrogen
Metalorganic vapour phase epitaxy

High Mobility HEMT Growth with Water-cooling MBE System T.Takamatsu, S.Takagi and G.Kido National Reserch Institute for Metals 3-13 Sakura, Tsukuba, Ibaraki, Japan High mobility GaAs / AlGaAs HEMT structures wer

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