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Lithography
Results: 801

#	Item
611	PROJECT RESULT Lithography T403: Extreme UV alpha tools integration consortium (EXTATIC) Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:39:53 Extreme ultraviolet lithography Microtechnology Extreme ultraviolet Photomask Photolithography Stepper Ultraviolet Semiconductor device fabrication Extreme Ultraviolet Explorer Electromagnetic radiation Materials science Spacecraft
612	PROJECT RESULT Lithography T405: EUV sources development (EUV Sources) Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:39:57 Microtechnology Extreme ultraviolet Photolithography Ultraviolet Photomask Stepper Laser Semiconductor device fabrication Cymer Inc. Electromagnetic radiation Extreme ultraviolet lithography Technology
613	T403-medea[removed]:47 Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:37:12 Ultraviolet Physics Immersion lithography Extreme ultraviolet lithography Photolithography Extreme ultraviolet
614	T401-medea+ LO1[removed]:11 Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:37:10 Photolithography IMEC Physics Resist Ultraviolet Laser Extreme ultraviolet lithography Computational lithography Technology Electromagnetic radiation Microtechnology
615	PROJECT RESULT Lithography T404: Extreme UV lithography masks (EXTUMASK) Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:39:55 Ultraviolet Extreme ultraviolet Mask 45 nanometer Microtechnology Multiple patterning Next-generation lithography Electromagnetic radiation Extreme ultraviolet lithography Photomask
616	PROJECT RESULT Lithography T406: Extreme UV consortium for imaging technology (ExCITe) Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:39:59 Chemistry Multiple patterning Photolithography Extreme ultraviolet Photoresist Ultraviolet 32 nanometer Nanoimprint lithography 45 nanometer Materials science Electromagnetic radiation Extreme ultraviolet lithography
617	PROJECT PROFILE T409: Development and proof of concept for projection mask-less lithography (Projection-ML2) HIGH-SPEED Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:37:20 Photolithography Extreme ultraviolet lithography Nanolithography Microelectromechanical systems Lithography 45 nanometer SEMATECH Next-generation lithography Materials science Technology Microtechnology
618	PROJECT PROFILE 2T302: Masks through users supply chain: leadership by excellence (MUSCLE) LITHOGRAPHY Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:36:04 Integrated circuits Photomask Photolithography Mask shop Semiconductor device fabrication Mask set Application-specific integrated circuit Very-large-scale integration Lithography Technology Materials science Microtechnology
619	WFD/PRINT SubFonds WESTFIELD COLLEGE PRINT COLLECTION 43 outsize items This sub-fonds contains prints and artwork dating between the Add to Reading List Source URL: www.library.qmul.ac.uk Language: English - Date: 2010-09-07 07:44:44 Giovanni Battista Piranesi Etching Intaglio Lithography William Hogarth Edition World Federation of the Deaf Mezzotint Aquatint Visual arts Printmaking Engraving
620	Project result CT301 I Extreme UV lithography entry point technology development [EXEPT] The extreme ultra-violet (EUV) Add to Reading List Source URL: www.catrene.org Language: English - Date: 2013-09-04 08:46:13 Extreme ultraviolet lithography Immersion lithography Multiple patterning Extreme ultraviolet Photomask SUSS MicroTec Lithography 32 nanometer Ultraviolet Materials science Electromagnetic radiation Technology

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