Gate dielectric

Results: 28



#Item
1Electromagnetism / Electrical engineering / Electronic engineering / Non-volatile memory / Semiconductor devices / MOSFETs / Field-effect transistor / Threshold voltage / Computer memory / Emerging technologies / Gate dielectric / Transistor

Electrically erasable non-volatile semiconductor memory

Add to Reading List

Source URL: ethw.org

Language: English - Date: 2011-10-12 18:24:23
2Electronic engineering / Transistors / High-k dielectric / Gate dielectric / Thermal oxidation / Semiconductor device fabrication / Silicon dioxide / Polycrystalline silicon / Negative bias temperature instability / Chemistry / Electromagnetism / Electronics

Photon Factory Activity Report 2005 #23Part BSurface and Interface 4C,6A,15C/2004G059 Residual Order in the Interfacial SiO2 Layer

Add to Reading List

Source URL: pfwww.kek.jp

Language: English - Date: 2010-01-05 10:32:23
3Annealing / Silicide / Photoemission spectroscopy / Chemistry / Physics / Electrical engineering / Electronic engineering / High-k dielectric / Transistors

Surface and Interface 2C/2002S2-002 Chemical reaction and metallic cluster formation by annealing-temperature control in ZrO2 gate insulator on Si

Add to Reading List

Source URL: pfwww.kek.jp

Language: English - Date: 2010-01-05 10:30:04
4Emission spectroscopy / Photoemission spectroscopy / Atomic physics / High-k dielectric / Core electron / Electron / Physics / Chemistry / Spectroscopy

Photon Factory Activity Report 2006 #24 Part BSurface and Interface 2C/2005S2-002 Analysis of x-ray irradiation effect in high-k gate dielectrics by time-dependent

Add to Reading List

Source URL: pfwww.kek.jp

Language: English - Date: 2010-01-05 10:33:37
5Transistors / Silicon dioxide / Ultra-high vacuum / MOSFET / Gallium nitride / Annealing / Chemistry / Electronic engineering / High-k dielectric

Photon Factory Activity Report 2006 #24 Part BChemistry 2C/2005S2-002 Thermal decomposition of LaAlO3/SiO2/Si gate stack structures studied by

Add to Reading List

Source URL: pfwww.kek.jp

Language: English - Date: 2010-01-05 10:34:17
6High-k dielectric / Transistors / Physics / Photoemission spectroscopy / Chemistry / Angle-resolved photoemission spectroscopy / Annealing / Layer / Materials science / Emission spectroscopy / Semiconductor device fabrication / Electronic engineering

Photon Factory Activity Report 2008 #26 Part BSurface and Interface 2C/2008S2-003 In-depth profiles of Hf-based gate insulator films on Si substrates studied by angle-resolved photoemission spectroscopy

Add to Reading List

Source URL: pfwww.kek.jp

Language: English - Date: 2010-01-05 10:36:04
7Thin film deposition / Electronic engineering / High-k dielectric / Transistors / Ceramic materials / Gate dielectric / Atomic layer deposition / Annealing / Equivalent oxide thickness / Chemistry / Materials science / Electromagnetism

Photon Factory Activity Report 2008 #26 Part BSurface and Interface 2C/2005S2-002 Control of oxidation and reduction in HfSiON/Si through N2 exposure Hiroyuki KAMADA*1, Tatsuhiko TANIMURA1, Satoshi TOYODA1-3, Hir

Add to Reading List

Source URL: pfwww.kek.jp

Language: English - Date: 2010-01-05 10:36:03
8Semiconductor device fabrication / Superhard materials / Transistors / Ceramic materials / Atomic layer deposition / High-k dielectric / Ruthenium(IV) oxide / Silicon dioxide / Titanium nitride / Chemistry / Matter / Electronic engineering

Photon Factory Activity Report 2009 #27 Part BSurface and Interface 2C/2008S2003 Interfacial reactions for Ru metal-electrode/HfSiON gate stack structures studied

Add to Reading List

Source URL: pfwww.kek.jp

Language: English - Date: 2010-12-27 22:22:07
9Transistors / Annealing / Silicon monoxide / High-k dielectric / Layer / Silicon dioxide / Silicide / Photoemission spectroscopy / Chemistry / Semiconductor device fabrication / Silicon compounds

Photon Factory Activity Report 2005 #23Part BSurface and Interface 2C/2002S2-002 Annealing-temperature dependence: Mechanism of Hf silicidation in HfO2 gate

Add to Reading List

Source URL: pfwww.kek.jp

Language: English - Date: 2010-01-05 10:32:21
10Physics / Environmental chemistry / Materials science / Spectroscopy / X-ray absorption spectroscopy / High-k dielectric / XANES / Science / Chemistry / Condensed matter physics

Photon Factory Activity Report 2004 #22 Part BSurface and Interface 2C/2002S2-002 Crystallization in HfO2 gate insulators with in situ annealing

Add to Reading List

Source URL: pfwww.kek.jp

Language: English - Date: 2010-01-05 10:31:27
UPDATE