Electromigration

Results: 49



#Item
1Rapid reversible electromigration of intercalated K ions within individual MoO3 nanobundle Zhibin Hu, Chenggang Zhou, Rajiv Ramanujam Prabhakar, Sharon Xiaodai Lim, Yinghui Wang et al. Citation: J. Appl. Phys. 113, 02431

Rapid reversible electromigration of intercalated K ions within individual MoO3 nanobundle Zhibin Hu, Chenggang Zhou, Rajiv Ramanujam Prabhakar, Sharon Xiaodai Lim, Yinghui Wang et al. Citation: J. Appl. Phys. 113, 02431

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Source URL: www.ciba.nus.edu.sg

Language: English - Date: 2014-11-06 23:11:15
    2Subscriber access provided by - Access paid by the | UC Irvine Libraries  Letter Reconnectable Sub-5 nm Nanogaps in Ultralong Gold Nanowires Chengxiang Xiang, Jung Yun Kim, and Reginald M. Penner

    Subscriber access provided by - Access paid by the | UC Irvine Libraries Letter Reconnectable Sub-5 nm Nanogaps in Ultralong Gold Nanowires Chengxiang Xiang, Jung Yun Kim, and Reginald M. Penner

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    Source URL: cfse.ps.uci.edu

    Language: English - Date: 2011-11-02 16:52:47
    3Microsoft Word - In-situ Sensors[1].doc

    Microsoft Word - In-situ Sensors[1].doc

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    Source URL: www.ridgetopgroup.com

    Language: English - Date: 2015-07-18 01:30:10
    4Ridgetop Group, IncWest Ina Road Tucson, AZPhone: +Fax: +www.RidgetopGroup.com

    Ridgetop Group, IncWest Ina Road Tucson, AZPhone: +Fax: +www.RidgetopGroup.com

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    Source URL: www.ridgetopgroup.com

    Language: English - Date: 2015-07-18 01:30:09
    5PROCHEK PRODUCT BRIEF E N G I N E E R I N G  I N N O V A T I O N

    PROCHEK PRODUCT BRIEF E N G I N E E R I N G I N N O V A T I O N

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    Source URL: www.ridgetopgroup.com

    Language: English - Date: 2015-07-18 01:30:09
    6Microsoft Word - Prognostic Techniques for Deep Submicron Semiconductors[1].

    Microsoft Word - Prognostic Techniques for Deep Submicron Semiconductors[1].

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    Source URL: www.ridgetopgroup.com

    Language: English - Date: 2015-07-18 01:30:09
    7Rapid Characterization Method for New Semiconductor Processes Esko Mikkola, Ph.D., & Andrew Levy Ridgetop Group IncWest Ina Road Tucson, AZUSA

    Rapid Characterization Method for New Semiconductor Processes Esko Mikkola, Ph.D., & Andrew Levy Ridgetop Group IncWest Ina Road Tucson, AZUSA

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    Source URL: www.ridgetopgroup.com

    Language: English - Date: 2015-07-18 01:30:09
    8Olzat Toktarbaiuly Electromigration of atoms on vicinal surfaces at high temperatures Step bunching of vicinal Si(111), W(110) and Al2O3are discussed and an experimental setup built to anneal the samples in a cont

    Olzat Toktarbaiuly Electromigration of atoms on vicinal surfaces at high temperatures Step bunching of vicinal Si(111), W(110) and Al2O3are discussed and an experimental setup built to anneal the samples in a cont

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    Source URL: www.tcd.ie

    Language: English - Date: 2016-01-20 08:36:56
      9SISPAD 2012, September 5-7, 2012, Denver, CO, USA  Modeling of Electromigration Induced Resistance Change in Three-Dimensional Interconnects with Through Silicon Vias R. L. de Orio∗ , H. Ceric∗† , and S. Selberherr

      SISPAD 2012, September 5-7, 2012, Denver, CO, USA Modeling of Electromigration Induced Resistance Change in Three-Dimensional Interconnects with Through Silicon Vias R. L. de Orio∗ , H. Ceric∗† , and S. Selberherr

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      Source URL: in4.iue.tuwien.ac.at

      Language: English - Date: 2013-02-12 08:39:07
        10SISPAD 2012, September 5-7, 2012, Denver, CO, USA  TCAD Study of Electromigration Failure Modes in Sn-Based Solder Bumps H. Cerica,b, R. L. de Oriob, and S. Selberherrb a

        SISPAD 2012, September 5-7, 2012, Denver, CO, USA TCAD Study of Electromigration Failure Modes in Sn-Based Solder Bumps H. Cerica,b, R. L. de Oriob, and S. Selberherrb a

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        Source URL: in4.iue.tuwien.ac.at

        Language: English - Date: 2013-02-12 08:39:10