JOURNAL OF APPLIED PHYSICS VOLUME 93, NUMBER 9

First Page		Document Content
Date: 2010-12-09 11:08:13 Technology Silicon on insulator Thermal oxidation Ion implantation Wafer Microelectromechanical systems Silicon on sapphire Smart Cut Epitaxy Semiconductor device fabrication Materials science Microtechnology		JOURNAL OF APPLIED PHYSICS VOLUME 93, NUMBER 9 Add to Reading List Source URL: www.soitec.com Download Document from Source Website File Size: 1,22 MB Share Document on Facebook

	Proceedings of the XI International Conference on Ion Implantation and other Applications of Ions and Electrons — ION 2016 Kazimierz Dolny, Poland, June 13–16, 2016 Editors of the Proceedings: DocID: 1v7cn - View Document
	Porous Surface on NiTi Alloy Produced by Plasma Ion Implantation DocID: 1uHko - View Document
	Titanium Oxide Layers Prepared by Metal Plasma Immersion Ion Implantation and Deposition as Hemocompatible Surfaces DocID: 1u5Re - View Document
	Structure and Properties of Titanium-Based Coatings prepared by Metal Plasma Immersion Ion Implantation and Deposition I. Tsyganov, M. F. Maitz1, E. Wieser1, E. Richter1 and H. Reuther1 Lipetsk State Technical University DocID: 1tZXb - View Document
	Surface treatment by ion implantation DocID: 1q81c - View Document