Resist

Results: 761



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41Journal of Photochemistry and Photobiology A: Chemistry–154  Nanopatterning with conformable phase masks Joana Maria a , Seokwoo Jeon a , John A. Rogers a,b,∗ a

Journal of Photochemistry and Photobiology A: Chemistry–154 Nanopatterning with conformable phase masks Joana Maria a , Seokwoo Jeon a , John A. Rogers a,b,∗ a

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Source URL: rogers.matse.illinois.edu

Language: English - Date: 2004-09-07 14:36:00
42APPLIED PHYSICS LETTERS 92, 173115 共2008兲  Patterning of single walled carbon nanotubes using a low-fluence excimer laser photoablation process Junghun Chae,1 Xinning Ho,2 John A. Rogers,2,3 and Kanti Jain1,a兲 1

APPLIED PHYSICS LETTERS 92, 173115 共2008兲 Patterning of single walled carbon nanotubes using a low-fluence excimer laser photoablation process Junghun Chae,1 Xinning Ho,2 John A. Rogers,2,3 and Kanti Jain1,a兲 1

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Source URL: rogers.matse.illinois.edu

Language: English - Date: 2008-05-03 00:17:38
43PNAS PLUS  Transgenic Anopheles stephensi coexpressing single-chain antibodies resist Plasmodium falciparum development Alison T. Isaacsa,b, Nijole Jasinskieneb, Mikhail Tretiakovb, Isabelle Thieryc, Agnès Zettorc, Cath

PNAS PLUS Transgenic Anopheles stephensi coexpressing single-chain antibodies resist Plasmodium falciparum development Alison T. Isaacsa,b, Nijole Jasinskieneb, Mikhail Tretiakovb, Isabelle Thieryc, Agnès Zettorc, Cath

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Source URL: www.microbiology.uci.edu

Language: English - Date: 2015-04-02 17:36:59
44FRAUNHOFER INSTI TUTE FOR I NTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB  TECHNOLOGY S IMULATION THE TECHNOLOGY SIMULATION DEPARTMENT

FRAUNHOFER INSTI TUTE FOR I NTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB TECHNOLOGY S IMULATION THE TECHNOLOGY SIMULATION DEPARTMENT

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Source URL: www.iisb.fraunhofer.de

Language: English - Date: 2016-06-08 05:52:49
45Microsoft Word - exposure_request_form.dot

Microsoft Word - exposure_request_form.dot

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Source URL: camd.lsu.edu

Language: English - Date: 2009-01-29 10:14:22
46Heat Load Experiments at CAMD and CLS D. Yemane1, S. Achenbach2, J. Goettert1, R. Guntaka3, D. Haluzan2, K. Nandakumar3, V. Singh1, V. Subramanian2, G. Wells2 1 LSU Center for Advanced Microstructures and Devices (CAMD),

Heat Load Experiments at CAMD and CLS D. Yemane1, S. Achenbach2, J. Goettert1, R. Guntaka3, D. Haluzan2, K. Nandakumar3, V. Singh1, V. Subramanian2, G. Wells2 1 LSU Center for Advanced Microstructures and Devices (CAMD),

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Source URL: camd.lsu.edu

Language: English - Date: 2012-07-25 17:48:50
47

Helpful Hints During training presentations, activities, and action planning Make notes of your own examples List any needed clarifications and questions you have Be a good model and resist side talk by listening and

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Source URL: rpdc.mst.edu

- Date: 2014-01-22 04:30:34
    48Combinatorial Multilevel Mold Insert Using Micromachining and X-ray Lithography V. Singh1, J. Goettert1, O. Jinka1,2,* 1  Center for Advanced Microstructures and Devices (CAMD)

    Combinatorial Multilevel Mold Insert Using Micromachining and X-ray Lithography V. Singh1, J. Goettert1, O. Jinka1,2,* 1 Center for Advanced Microstructures and Devices (CAMD)

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    Source URL: www.camd.lsu.edu

    Language: English - Date: 2012-07-31 11:19:10
    49Strategies to Resist Plagiarism An E-Lesson from The School for Ethical Education Objectives: SEE’s two-part Resisting Plagiarism lesson will help

    Strategies to Resist Plagiarism An E-Lesson from The School for Ethical Education Objectives: SEE’s two-part Resisting Plagiarism lesson will help

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    Source URL: ethicsed.org

    Language: English - Date: 2013-11-20 16:16:39
    50SUEX Dry Film Resist – A new Material for High Aspect Ratio Lithography Donald W Johnsona, Jost Goettertb, Varshni Singhb and Dawit Yemaneb a  b

    SUEX Dry Film Resist – A new Material for High Aspect Ratio Lithography Donald W Johnsona, Jost Goettertb, Varshni Singhb and Dawit Yemaneb a b

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    Source URL: www.camd.lsu.edu

    Language: English - Date: 2012-08-02 10:13:02