Chapter[removed]VLSI Etchants

First Page		Document Content
Date: 2011-08-05 15:10:22 Technology Etching Plasma processing Microelectromechanical systems Tetramethylammonium hydroxide Buffered oxide etch Plasma etcher Plasma etching Photoresist Materials science Semiconductor device fabrication Microtechnology		Chapter[removed]VLSI Etchants Add to Reading List Source URL: nanolab.berkeley.edu Download Document from Source Website File Size: 142,03 KB Share Document on Facebook

	High-Aspect Ratio Deep Sub-Micron α-Si Gate Etch Process Control H.-M. Park, T. L. Brock, D. Grimard, J. W. Grizzle and F. L. Terry, Jr University of Michigan 195th Spring Meeting of ECS DocID: 1p1ER - View Document
	PDF Document DocID: 194LO - View Document
	Chapter[removed]Miscellaneous Etchants DocID: FnTw - View Document
	Chapter[removed]VLSI Etchants DocID: FjrJ - View Document
	Surface Cleaning and Wet Processing Terminology Contributions by Motorola Corporation DocID: uSvf - View Document