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Chemistry / Etching / RCA clean / Buffered oxide etch / Wafer / Piranha solution / Photoresist / Plasma etching / Chemical vapor deposition / Semiconductor device fabrication / Materials science / Microtechnology


Surface Cleaning and Wet Processing Terminology Contributions by Motorola Corporation
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Document Date: 1999-12-02 13:39:32


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File Size: 33,00 KB

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