Eur. Phys. J. Appl. Phys. 28, 265–[removed]DOI: [removed]epjap:[removed]

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Date: 2005-04-28 19:13:20 Oxides Thin film deposition Ceramic materials Semiconductor device fabrication Digital electronics Atomic layer deposition Hafnium(IV) oxide MOSFET Equivalent oxide thickness Chemistry Electromagnetism Matter		Eur. Phys. J. Appl. Phys. 28, 265–[removed]DOI: [removed]epjap:[removed] Add to Reading List Source URL: www.stanford.edu Download Document from Source Website File Size: 1,97 MB Share Document on Facebook

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