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Integrated circuit layout / Multiple patterning / Electronic engineering / Design rule checking / Process migration


Sagantec announces nmigrate™ Migration and DRC correction tool for advanced nanometer technologies SANTA CLARA, California – May 14, 2012 – Sagantec announced today its nmigrate layout migration and optimization to
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Document Date: 2014-06-17 16:11:45


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City

San Francisco / SANTA CLARA / /

Company

Sagantec North America Inc. / NP-Komplete Technologies / /

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IndustryTerm

optimization tool / correction tool / process migration tools / nmigrate tool / 20nm process technologies / software license model / 20nm technology rules / 20nm technologies / technology design rules / technology node / 2D dynamic compaction technology / dynamic layout compaction technology / optimization solution / /

Person

Coby Zelnik / /

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Position

president and CEO / /

ProvinceOrState

California / /

Technology

semiconductor / 2D dynamic compaction technology / dynamic layout compaction technology / 20nm technologies / 20nm process technologies / /

URL

http /

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