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Electronic engineering / Back end of line / Chemical vapor deposition / Integrated circuit / Titanium nitride / Capacitor / Electromigration / Low-k dielectric / Semiconductor device fabrication / Technology / Chemistry
Date: 2010-08-11 20:37:36
Electronic engineering
Back end of line
Chemical vapor deposition
Integrated circuit
Titanium nitride
Capacitor
Electromigration
Low-k dielectric
Semiconductor device fabrication
Technology
Chemistry

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