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Technology / Etching / Plasma processing / Microelectromechanical systems / Tetramethylammonium hydroxide / Buffered oxide etch / Plasma etcher / Plasma etching / Photoresist / Materials science / Semiconductor device fabrication / Microtechnology
Date: 2011-08-05 15:10:22
Technology
Etching
Plasma processing
Microelectromechanical systems
Tetramethylammonium hydroxide
Buffered oxide etch
Plasma etcher
Plasma etching
Photoresist
Materials science
Semiconductor device fabrication
Microtechnology

Chapter[removed]VLSI Etchants

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Source URL: nanolab.berkeley.edu

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File Size: 142,03 KB

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