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Sputtering
Results: 228

#	Item
81	Investigation of the origin of environmental compounds from indoor air samples via accelerator mass spectrometry W. Kretschmer,1 M. Schindler,1 A. Scharf,1 and A. Stuhl1 1 Physics Institute, University of Erlangen, Add to Reading List Source URL: hias.anu.edu.au Language: English - Date: 2013-03-27 23:38:40 Chemical pathology Building biology Accelerator mass spectrometry Accelerant Sputtering Carbon Volatile organic compound Chemistry Mass spectrometry Spectroscopy
82	Comparative Divertor-Transport Study for W7-AS and LHD Add to Reading List Source URL: www.nifs.ac.jp Language: English - Date: 2013-09-30 21:26:57 Plasma Van Allen radiation belt Tokamak Sputtering Fusion reactors Physics Stellarator
83	PDF Document Add to Reading List Source URL: dpc.nifs.ac.jp Language: English - Date: 2012-03-08 01:56:28 Materials science Science Catalysis Adsorption Colloidal chemistry Sputtering Physisorption Chemisorption Desorption Chemistry Physical chemistry Surface chemistry
84	Removal of Hydrogenated Carbon from W-C Deposits by Microwave Oxygen Plasma Alenka Vesel, Miran Mozetič, Peter Panjan, Aleksander Drenik Jožef Stefan Institute Jamova cesta 39, SI-1000 Ljubljana, Slovenia alenka.vesel@ Add to Reading List Source URL: www.djs.si Language: English - Date: 2012-07-16 15:39:30 Semiconductor device fabrication Tungsten compounds Nonmetals Coatings Oxide Etching Tungsten Sputtering Sputter deposition Chemistry Matter Chemical elements
85	PDF Document Add to Reading List Source URL: dpc.nifs.ac.jp Language: English - Date: 2012-03-08 01:56:12 Astrophysics Plasma Impurity Carbon Sputtering Hydrogen Chemistry Matter Coatings
86	Microsoft Word - OnLineProceedings_Frach_TiO2_Quantsol_2006_2seitig.doc Add to Reading List Source URL: www.quantsol.org Language: English - Date: 2010-05-11 12:44:22 Plasma processing Photochemistry Coatings Sputter deposition Thin film Titanium dioxide Photocatalysis Sputtering Electron beam physical vapor deposition Chemistry Thin film deposition Semiconductor device fabrication
87	IonEtch Sputter Ion Gun, GenII The tectra IonEtch ion gun is a filamentless ion source based on a microwave plasma discharge. The IonEtch works by coupling microwave energy into a coaxial waveguide and from there via eva Add to Reading List Source URL: www.tectra.de Language: English - Date: 2010-10-02 06:51:58 Ions Matter Semiconductor device fabrication Plasma physics Ion source Plasma Reactive-ion etching Ion gun Sputtering Chemistry Physics Plasma processing
88	Structure Probe, Inc. / SPI Supplies Street address for UPS, FedEx, DHL, other couriers, trucks 569 East Gay Street West Chester, PAMailing address P.O. Box 656 West Chester, PAUSA Add to Reading List Source URL: www.2spi.com Language: English - Date: 2011-11-30 15:48:08 Technology Physics Materials science Coatings Plasma processing Sputter deposition Sputtering Sputter coating Electron microscope Semiconductor device fabrication Thin film deposition Chemistry
89	Sample Results Summary Sheet Please return this form to the Curator for each allocated Sample Sample ID: RA-QD02-0014 Add to Reading List Source URL: hayabusaao.isas.jaxa.jp Language: English - Date: 2014-12-15 18:59:37 Nesosilicates Olivine Vienna Standard Mean Ocean Water Sputter coating Sputtering Science Electron microscopy Chemistry Materials science Microscopy
90	Sample Results Summary Sheet Please return this form to the Curator for each allocated Sample Sample ID: RA-QD02-0035 Add to Reading List Source URL: hayabusaao.isas.jaxa.jp Language: English - Date: 2014-12-15 18:59:40 Nesosilicates Olivine Vienna Standard Mean Ocean Water Sputter coating Sputtering Science Electron microscopy Chemistry Materials science Microscopy

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