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Semiconductor device fabrication / Physics / Manufacturing / Vacuum / Coatings / Chemical vapor deposition / Plasma-enhanced chemical vapor deposition / Spectroscopy / Thin film / Chemistry / Thin film deposition / Plasma processing


PECVD HYDROGENATED AMORPHOUS CARBON FILMS: GROWTH AND CHARACTERIZATION ROZIDAWATI BINTI AWANG
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Document Date: 2009-12-03 00:39:18


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File Size: 543,71 KB

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Company

Solid State Laboratory / Hydrogenated Amorphous Carbon (a-C /

Country

Malaysia / /

Facility

University of Malaya / Solid State Laboratory / University Malaya / /

IndustryTerm

kesan gas metana / diluent gas / optical and chemical bonding properties / dicampurkan dengan gas hidrogen atau gas helium / terhadap gas / berkurang bila nisbah kadar-aliran gas campuran / dicampurkan dengan gas hydrogen / chemical vapour deposition / menggunakan gas metana yang / atau gas helium / dicampurkan dengan gas / /

Organization

Carbon Clusters Summary CHAPTER / Ministry of Science and Technology / DEGREE OF DOCTOR OF PHILOSOPHY FACULTY OF SCIENCE / Physics Department / University of Malaya / Universiti Kebangsaan Malaysia / /

Person

Ismail Che Lah / Raman Spectra / Abdul Rahman / Aimann / Saadah Abdul / Muhammad Mat Salleh / Mohamad Aruf / Ma / Khalijah / Muhamad Zahari / /

Position

supervisor / /

ProgrammingLanguage

DC / /

Technology

WAP / Hybridization / spectroscopy / Radio Frequency / /

SocialTag