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Thin film deposition / Light sources / Photonics / Gallium arsenide / Hydride vapour phase epitaxy / Cathodoluminescence / Crystallographic defect / Periodic poling / Epitaxy / Chemistry / Optics / Semiconductor device fabrication


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Document Date: 2012-09-27 05:37:50

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City

Valladolid / Weinheim / Palaiseau Cedex / /

Company

Hydride Vapour Phase Epitaxy / WILEY-VCH Verlag GmbH & Co. KGaA / Thales / /

Country

France / Netherlands / Spain / /

/

IndustryTerm

gas flow rates / versatile technology / quality control tools / precursor gas composition / low energy side / local gas sensing / diverse applications / mature epitaxy technology / minority carrier diffusion length / high energy tail corresponding / /

Organization

Universidad de Valladolid / France III-V Lab / Spanish Government / European Commission / /

Person

M. Avella / V / Carl-Zeiss Leo / Augustin Fresnel / J. S. Harris / Jr. / S. Degroote / V / /

Position

General / Corresponding author / /

PublishedMedium

Physica B / /

Technology

semiconductor / radiation / laser / av / remote sensing / lasers / mature epitaxy technology / recombination / photolithography / /

URL

www.pss-c.com / /

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