University of Sheffield / University of Cambridge / /
IndustryTerm
metal / gate metal / post-gate metal passivation / chemical vapor deposition / pre-gate metal treatment / hydrogen peroxide solution / gate metal deposition / chemical / chemical treatments / electronics applications / post-gate metal treatment / /
Organization
University of Sheffield / University of Cambridge / /
Person
Mike Cooke / /
Technology
semiconductor / 90 Technology / chemical vapor deposition / /
90 Technology focus: GaN HEMTs Reducing gate leakage and current collapse in GaN HEMTs on silicon UK research team combines sulfuric acid treatment and silicon nitride