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Technology / Microelectromechanical systems / Etching / Wafer / Microfabrication / Deep reactive-ion etching / Chemical-mechanical planarization / Thermal oxidation / Silicon on insulator / Semiconductor device fabrication / Materials science / Microtechnology


A new low-temperature high-aspect-ratio MEMS process using plasma activated wafer bonding
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Document Date: 2013-09-17 15:11:17


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File Size: 1,79 MB

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