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Extreme ultraviolet lithography / Multiple patterning / Nanoimprint lithography / Immersion lithography / Electron beam lithography / Maskless lithography / Photomask / Resist / Lithography / Microtechnology / Materials science / Technology


INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS[removed]EDITION
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Document Date: 2014-03-30 21:14:00

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File Size: 157,59 KB

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City

Toyama / San Jose / /

Company

Nanoimprint CROSSCUT NEEDS AND POTENTIAL SOLUTIONS / /

Country

Japan / /

Facility

Factory Integration / /

IndustryTerm

finFET devices / logic devices / exposure tools / mask infrastructure / semiconductor device / 193nm exposure tools / technology needs / process technology / semiconductor manufacturing / functioning devices / potential solution / pilot tool / Metal levels / potential solutions / post processing / actual chip / pilot tools / e-beam / e-beams / actual working tools / exposure tool / finFET containing chip / metal layers / /

Organization

Directed Self Assembly / Self Assembly / /

Technology

semiconductor / finFET containing chip / defect LITHOGRAPHY TECHNOLOGY / existing process technology / flash memory / 1 Lithography Technology / alternative imaging technologies / actual chip / patterning technology / Logic chips / LITHOGRAPHY / Lithography Technology / Simulation / Process control / flash / /

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