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![]() Date: 2014-11-07 14:34:40Mask data preparation Digital electronics Synopsys GDSII Optical proximity correction Mask inspection Electronic design Electronic engineering Electronic design automation CATS | Add to Reading List |
![]() | Datasheet CATS The MDP Standard OverviewDocID: VVGR - View Document |
![]() | Datasheet CATS The MDP Standard OverviewDocID: tsCS - View Document |
![]() | Collection 5 Changes to MODIS Cloud Mask (35_L2) Significant improvements have been made to the MODIS cloud mask (MOD35) in preparation for Collection 5 reprocessing and forward stream data production. Most of the modifiDocID: osOc - View Document |
![]() | J. Micro/Nanolith. MEMS MOEMS 6共3兲, 031005 共Jul–Sep 2007兲 Performance-driven optical proximity correction for mask cost reduction Puneet Gupta Blaze DFM, IncorporatedDocID: bSVW - View Document |