Back to Results
First PageMeta Content
Microtechnology / Optical proximity correction / Resolution enhancement technologies / 65 nanometer / Mask data preparation / Physical design / Design closure / Photolithography / Photomask / Electronic engineering / Electronic design automation / Materials science


J. Micro/Nanolith. MEMS MOEMS 6共3兲, 031005 共Jul–Sep 2007兲 Performance-driven optical proximity correction for mask cost reduction Puneet Gupta Blaze DFM, Incorporated
Add to Reading List

Document Date: 2010-08-13 22:34:31


Open Document

File Size: 474,35 KB

Share Result on Facebook
UPDATE