MOSFETs

Results: 57



#Item
21

SISPAD 2012, September 5-7, 2012, Denver, CO, USA Modeling Source/Drain Contact Resistance in Nanoscale MOSFETs E. Chen*, Anson C-C Wang, H.S. Chen, W.H. Hsieh, T-H Yu, T.M. Shen, Jeff Wu, and C.H. Diaz TCAD Division, T

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Source URL: in4.iue.tuwien.ac.at

Language: English - Date: 2013-02-12 08:39:10
    22

    SISPAD 2012, September 5-7, 2012, Denver, CO, USA A Unified Computational Scheme for 3D Statistical Simulation of Reliability Degradation of Nanoscale MOSFETs F. Adamu-Lema, S. Amoroso, S. Markov, L. Gerrer

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    Source URL: in4.iue.tuwien.ac.at

    Language: English - Date: 2013-02-12 08:39:05
      23

      SISPAD 2012, September 5-7, 2012, Denver, CO, USA 3D simulations of random dopant induced threshold voltage variability in inversion–mode In0.53Ga0.47As GAA MOSFETs N. Seoane, A. Garcia–Loureiro, E. Comesa˜na, R. V

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      Source URL: in4.iue.tuwien.ac.at

      Language: English - Date: 2013-02-12 08:39:09
        24

        80 Technology focus: InGaAs MOSFETs High-pressure anneal for indium gallium arsenide transistors Process reduces interface and border traps in aluminium oxide/hafnium dioxide

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        Source URL: www.semiconductor-today.com

        Language: English - Date: 2015-10-01 12:01:02
          25

          POLE-ZERO is a 4-pole (24dB/octave) low pass Voltage Controlled Filter (VCF) utilizing MOSFET transistors. MOSFETs are known for their soft, vacuum tube like distortion when overdriven. POLE-ZERO is designed to exploit t

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          Source URL: www.wmdevices.com

          Language: English
            26

            A Monte-Carlo Study of the Role of Scattering in Deca-nanometer MOSFETs  P. Palestri, D. Esseni, S. Eminente , C. Fiegna  , E. Sangiorgi and L. Selmi DIEG, Univ. of Udine, Via delle Scienze 208, 33100 Udine, Italy, FA

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            Source URL: www.his.com

            Language: English
              27Emerging technologies / Nanomaterials / MOSFET / Silicon dioxide / Amorphous silicon / Electronic band structure / Quantum dot / Crystal / Nanowire / Chemistry / Physics / Materials science

              696 IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 62, NO. 3, MARCH 2015 Atomic Level Modeling of Extremely Thin Silicon-on-Insulator MOSFETs Including

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              Source URL: yangtze.hku.hk

              Language: English - Date: 2015-04-21 18:39:08
              28Power electronics / Electromagnetism / MOSFET / H bridge / Diode / Electronic engineering / Electronics / Logic families

              DIO 4469 Why Diodes - MOSFET2_:05 Page 1 WHY DIODES – MOSFET2 Why DIODES? MOSFETs

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              Source URL: diodes.com

              Language: English - Date: 2014-10-30 07:48:49
              29Technology / Microtechnology / Etching / Microelectromechanical systems / Reactive-ion etching / Nanowire / Indium gallium arsenide / MOSFET / Dry etching / Semiconductor device fabrication / Materials science / Chemistry

              IEEE ELECTRON DEVICE LETTERS, VOL. 35, NO. 5, MAY[removed]Nanometer-Scale Vertical-Sidewall Reactive Ion Etching of InGaAs for 3-D III-V MOSFETs

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              Source URL: www-mtl.mit.edu

              Language: English - Date: 2014-05-20 14:14:37
              30Physics / Electromagnetism / Electrical engineering / Contact resistance / Ohmic contact / MOSFET / Indium gallium arsenide / Electrical resistivity and conductivity / Transistor / Materials science / Chemistry / Physical quantities

              178 IEEE ELECTRON DEVICE LETTERS, VOL. 35, NO. 2, FEBRUARY 2014 A Test Structure to Characterize Nano-Scale Ohmic Contacts in III–V MOSFETs

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              Source URL: www-mtl.mit.edu

              Language: English - Date: 2014-04-22 16:07:00
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