<--- Back to Details
First PageDocument Content
Extreme ultraviolet lithography / Extreme ultraviolet / Microtechnology / Immersion lithography / Computational lithography / Interference lithography / Photoresist / Photomask / College of Nanoscale Science and Engineering / Materials science / Electromagnetic radiation / Technology
Date: 2015-04-13 10:58:59
Extreme ultraviolet lithography
Extreme ultraviolet
Microtechnology
Immersion lithography
Computational lithography
Interference lithography
Photoresist
Photomask
College of Nanoscale Science and Engineering
Materials science
Electromagnetic radiation
Technology

Add to Reading List

Source URL: spie.org

Download Document from Source Website

File Size: 1,18 MB

Share Document on Facebook

Similar Documents

Cover Picture: An Epoxy Photoresist Modified by Luminescent Nanocrystals for the Fabrication of 3D High-Aspect-Ratio Microstructures (Adv. Funct. Mater)

DocID: 1rAvn - View Document

Chemistry / Materials science / Physics / Matter / Microtechnology / LIGA / X-ray lithography / Photoresist / Canadian Light Source / Resist / Beamline / Poly

Heat Load Experiments at CAMD and CLS D. Yemane1, S. Achenbach2, J. Goettert1, R. Guntaka3, D. Haluzan2, K. Nandakumar3, V. Singh1, V. Subramanian2, G. Wells2 1 LSU Center for Advanced Microstructures and Devices (CAMD),

DocID: 1rdcU - View Document

Chemistry / Materials science / Electromagnetic radiation / Microtechnology / Photolithography / Nanolithography / Photoresist / Electron-beam lithography / Mask / Ultraviolet / Resist / Atomic-force microscopy

Journal of Photochemistry and Photobiology A: Chemistry–154 Nanopatterning with conformable phase masks Joana Maria a , Seokwoo Jeon a , John A. Rogers a,b,∗ a

DocID: 1r33C - View Document

Plasma physics / Chemistry / Matter / Nanomaterials / Emerging technologies / Manufacturing / Carbon nanotubes / Space elevator / Laser ablation / Resist / Photoresist / Nanotube

APPLIED PHYSICS LETTERS 92, 173115 共2008兲 Patterning of single walled carbon nanotubes using a low-fluence excimer laser photoablation process Junghun Chae,1 Xinning Ho,2 John A. Rogers,2,3 and Kanti Jain1,a兲 1

DocID: 1qXkV - View Document

Chemistry / Matter / Materials science / Biomaterials / Emerging technologies / Fracture mechanics / Polydimethylsiloxane / Graphene / Potential applications of graphene / Photoresist / Strength of materials

Interface mechanics of adhesiveless microtransfer printing processes H.-J. Kim-Lee, A. Carlson, D. S. Grierson, J. A. Rogers, and K. T. Turner Citation: Journal of Applied Physics 115, ); doi:

DocID: 1qW6E - View Document