Back to Results
First PageMeta Content
Physics / Plasma processing / Materials science / Nanoelectronics / Nanowire / Chemical vapor deposition / Plasma-enhanced chemical vapor deposition / Dielectric spectroscopy / Epitaxy / Thin film deposition / Semiconductor device fabrication / Chemistry


Characterization of Si nanowires produced by PE-CVD method N. 1 Hemed-Mintz ; 1
Add to Reading List

Document Date: 2014-01-12 06:54:19


Open Document

File Size: 592,17 KB

Share Result on Facebook

City

Ramat-Gan / /

Company

APTMS / /

Country

Israel / /

Facility

Tel Aviv University / Bar-Ilan University / /

IndustryTerm

sensor applications / biological solution / chemical vapor deposition / stainless steel / chemical resistance / low cost manufacturing / wearable devices / electrolyte solution / chemical processes / metal catalyst / chemical interaction / /

Organization

Bar-Ilan University / Engineering Faculty / Tel Aviv University / Tel Aviv / Department of Chemistry / /

/

Technology

semiconductor / spectroscopy / biosensors / CVD / chemical vapor deposition / /

SocialTag