Microsoft Word - 20111001UpdatedMap_en.doc - Design pattern - Document - PDFSEARCH.IO

First Page		Document Content
Date: 2011-09-30 22:34:55 Sendai IMEC Leuven Silicon-germanium Doping MOSFET International Technology Roadmap for Semiconductors Photonics Tohoku University Chemistry Electronics Electronic engineering		Microsoft Word - 20111001UpdatedMap_en.doc Add to Reading List Source URL: www.murota.riec.tohoku.ac.jp Download Document from Source Website File Size: 735,06 KB Share Document on Facebook

	Electric field effect thermoelectric transport in individual silicon and germanium/silicon nanowires Electric field effect thermoelectric transport in individual silicon and germanium/silicon nanowires DocID: 1t65I - View Document
	2016 General Europractice MPW runs Schedule and Prices Accessible for universities, research institutes and companies Version– v15 www.europractice-ic.com Dear customer, DocID: 1r4CM - View Document
	Advanced IC Process Characterization Tool Puts Reliability Data in Hands of Fabless Design Houses ProChek™ Measures Critical DSM Degradation Effects in Hours, Not Weeks Anaheim, California, September 19, Ridget DocID: 1qcbb - View Document
	2016 mini@sic Europractice MPW runs Schedule and Prices Accessible for universities & research institutes Version – v12 mini@sic DocID: 1pGbK - View Document
	) ) Taeseup Song,† Huanyu Cheng,‡ Heechae Choi,† Jin-Hyon Lee,† Hyungkyu Han,† Dong Hyun Lee,† Dong Su Yoo,† Moon-Seok Kwon,§ Jae-Man Choi,§ Seok Gwang Doo,§ Hyuk Chang,§ Jianliang Xiao,^ DocID: 1pnr7 - View Document