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City Tokyo / / Company HfO2 Thin Films / / Country Japan / / Facility The University of Tokyo / Photon Factory / / IndustryTerm metal / energy loss spectra / insufficient energy resolution / metal oxides / energy dispersive x-ray / similar chemical shift features / chemical states / / MusicGroup Surface / Interface / Si / HfO2 / Hf1 / Chemistry / / Organization University of Tokyo / Semiconductor Technology Academic Research Center / High-Energy Accelerator Organization / Department of Applied Chemistry / / Technology spectroscopy / radiation / 3 Semiconductor Technology / X-ray / dielectric / / SocialTag 
Photon Factory Activity Report 2002 #20 Part BSurface and Interface 2C/2002S2002 Chemistry and Band Offsets of HfO2 Thin Films for ULSI Gate Insulators