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Semiconductor devices / Intel / 45 nanometer / High-k dielectric / Microprocessor / Transistor / Multigate device / Atomic layer deposition / Electronic engineering / Electronics / Computer hardware
Date: 2014-01-13 18:23:07
Semiconductor devices
Intel
45 nanometer
High-k dielectric
Microprocessor
Transistor
Multigate device
Atomic layer deposition
Electronic engineering
Electronics
Computer hardware

Microsoft Word - Bio - Reza Arghavani LRCX

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