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Physics / Thin film deposition / Nanotechnology / Ions / Ion implantation / Ion beam / Ion track / Sputtering / Irradiation / Semiconductor device fabrication / Chemistry / Materials science


IAEA-TECDOC[removed]Ion Beam Applications in Surface and Bulk Modification of Insulators December 2008
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Document Date: 2009-01-21 05:44:48


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City

Vienna / Zagreb / /

Company

RBS / FERRO / iThemba LABS / /

Country

Thailand / Austria / Croatia / South Africa / /

Facility

Ruđer Bošković Institute / Chiang Mai University / ISOLDE Facility / Fast Neutron Research Facility / /

IndustryTerm

low energy ion beam deposition / metal / ion beam applications / polymers applications / metal-nitride layers / nanocrystalline metal layers / material processing / sputtered metal nitride thin films / low energy particle accelerators / information technology / energy deposition / energy management / embedded metal nanoclusters / luminescent devices / paramagnetic systems / conventional processing methods / low energy accelerators / electronic systems / lower energy ions / metal-carbon nanocomposite thin film materials / Homogeneous metal-carbon nanocomposite materials / non-magnetic systems / energy / been synthesized using low energy ion beam deposition / /

Movie

Depth Profiling / /

Organization

Chiang Mai University / Division of Physical and Chemical Sciences / Ruđer Bošković Institute / International Atomic Energy Agency / CRP / /

Person

Ion Beams / K. Bharuth-Ram Ion / Zvonko Medunić / ION BEAM / /

Position

RT / /

Technology

radiation / semiconductors / information technology / dielectric / spectroscopy / CVD / /

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