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Microtechnology / Semiconductor device fabrication / IMEC / Leuven / 45 nanometer / 65 nanometer / Etching / OK / Confidential / Materials science / Technology / Electronics


Fluorocarbon-Based Passivation in STI Plasma Etching A.P. Milenina, R. Athimulama, M. Demanda, and B. Coenegrachtsb b Lam © IMECCONFIDENTIAL
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Document Date: 2012-05-24 09:11:51

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File Size: 755,60 KB

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