Marvell NanoLab Member login Lab Manual Contents

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Date: 2013-02-12 10:07:02 Polymers Stepper Mask Key Ultraviolet Materials science Chemistry Photoresist		Marvell NanoLab Member login Lab Manual Contents Add to Reading List Source URL: nanolab.berkeley.edu Download Document from Source Website File Size: 436,65 KB Share Document on Facebook

	Cover Picture: An Epoxy Photoresist Modified by Luminescent Nanocrystals for the Fabrication of 3D High-Aspect-Ratio Microstructures (Adv. Funct. Mater) DocID: 1rAvn - View Document
	Heat Load Experiments at CAMD and CLS D. Yemane1, S. Achenbach2, J. Goettert1, R. Guntaka3, D. Haluzan2, K. Nandakumar3, V. Singh1, V. Subramanian2, G. Wells2 1 LSU Center for Advanced Microstructures and Devices (CAMD), DocID: 1rdcU - View Document
	Journal of Photochemistry and Photobiology A: Chemistry–154 Nanopatterning with conformable phase masks Joana Maria a , Seokwoo Jeon a , John A. Rogers a,b,∗ a DocID: 1r33C - View Document
	APPLIED PHYSICS LETTERS 92, 173115 共2008兲 Patterning of single walled carbon nanotubes using a low-fluence excimer laser photoablation process Junghun Chae,1 Xinning Ho,2 John A. Rogers,2,3 and Kanti Jain1,a兲 1 DocID: 1qXkV - View Document
	Interface mechanics of adhesiveless microtransfer printing processes H.-J. Kim-Lee, A. Carlson, D. S. Grierson, J. A. Rogers, and K. T. Turner Citation: Journal of Applied Physics 115, ); doi: DocID: 1qW6E - View Document