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Manufacturing / Coatings / Physics / Semiconductor device fabrication / Plasma processing / Sputter deposition / Sputtering / Thin film / Titanium dioxide / Chemistry / Thin film deposition / Materials science
Date: 2011-08-11 02:54:21
Manufacturing
Coatings
Physics
Semiconductor device fabrication
Plasma processing
Sputter deposition
Sputtering
Thin film
Titanium dioxide
Chemistry
Thin film deposition
Materials science

Optical properties of oxide thin films deposited by reactive HiPIMS

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