SIMULATION OF SPUTTER DEPOSITION 1 2

First Page		Document Content
Date: 2015-01-16 02:41:24 Materials science Thin film deposition Plasma physics Coatings Condensed matter physics Sputtering Molecular dynamics Sputter deposition Binary collision approximation Physics Chemistry Science		SIMULATION OF SPUTTER DEPOSITION 1 2 Add to Reading List Source URL: www.enas.fraunhofer.de Download Document from Source Website File Size: 463,75 KB Share Document on Facebook

	Perfect Scientific Manufacturing ダメージフリー回転マグネットスパッタ装置 Damage-Free Rotation Magnet Sputtering DocID: 1v4Rz - View Document
	Journal of Nuclear Materials 266±±227 Sputtering of beryllium, tungsten, tungsten oxide and mixed W±C layers by deuterium ions in the near-threshold energy range M.I. Guseva a, A.L. Suvorov DocID: 1uCY6 - View Document
	Characteristics of Indium Tin Oxide Films Deposited by DC and RF Magnetron Sputtering Wenli DENG*, Taizo OHGI, Hitoshi NEJO and Daisuke FUJITA National Research Institute for Metals, 1-2-1 Sengen, Tsukuba, Japan DocID: 1s15G - View Document
	GD Dayafternoon & 16 September 2016 DocID: 1qWHG - View Document
	One-dimensional carrier profiling of blanket and confined semiconducting structures Promoter: Prof. Dr. Ir. W. Vandervorst Contact and daily advisor: Dr. Ir. J. Bogdanowicz () Required backgroun DocID: 1qdx8 - View Document