Optimizing Sputtering Parameters to Minimize Roughness in Permalloy Thin Films

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Date: 2014-01-15 15:31:22 Chemistry Sputtering Thin film deposition Argon Matter Technology Sputter deposition Semiconductor device fabrication Materials science Coatings		Optimizing Sputtering Parameters to Minimize Roughness in Permalloy Thin Films Add to Reading List Source URL: www.ncnr.nist.gov Download Document from Source Website File Size: 1,28 MB Share Document on Facebook

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