RUSSIA MOSCOW CANADA DRESDEN

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Semiconductor device fabrication Materials science Chemistry Manufacturing Technology Sputter deposition Physical vapor deposition Sputtering Thin film Thin film deposition Plasma processing Coatings		RUSSIA MOSCOW CANADA DRESDEN Add to Reading List Source URL: www.vonardenne.biz Download Document from Source Website File Size: 2,06 MB Share Document on Facebook

	Perfect Scientific Manufacturing ダメージフリー回転マグネットスパッタ装置 Damage-Free Rotation Magnet Sputtering DocID: 1v4Rz - View Document
	Journal of Nuclear Materials 266±±227 Sputtering of beryllium, tungsten, tungsten oxide and mixed W±C layers by deuterium ions in the near-threshold energy range M.I. Guseva a, A.L. Suvorov DocID: 1uCY6 - View Document
	Characteristics of Indium Tin Oxide Films Deposited by DC and RF Magnetron Sputtering Wenli DENG*, Taizo OHGI, Hitoshi NEJO and Daisuke FUJITA National Research Institute for Metals, 1-2-1 Sengen, Tsukuba, Japan DocID: 1s15G - View Document
	GD Dayafternoon & 16 September 2016 DocID: 1qWHG - View Document
	One-dimensional carrier profiling of blanket and confined semiconducting structures Promoter: Prof. Dr. Ir. W. Vandervorst Contact and daily advisor: Dr. Ir. J. Bogdanowicz () Required backgroun DocID: 1qdx8 - View Document