PROCESS AND EQUIPMENT SIMULATION OF CHEMICAL VAPOR DEPOSITION Velocity

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Date: 2015-01-15 20:38:12 Semiconductor device fabrication Plasma processing Ceramic materials Chemical vapor deposition Metalorganic vapour phase epitaxy Silicon nitride Plasma-enhanced chemical vapor deposition Silicon dioxide Aluminium gallium nitride Chemistry Thin film deposition Nitrides		PROCESS AND EQUIPMENT SIMULATION OF CHEMICAL VAPOR DEPOSITION Velocity Add to Reading List Source URL: www.enas.fraunhofer.de Download Document from Source Website File Size: 443,54 KB Share Document on Facebook

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