<--- Back to Details
First PageDocument Content
Metrology / Electron beam lithography / Gaithersburg /  Maryland / National Institute of Standards and Technology / International System of Units
Date: 2013-01-18 23:12:35
Metrology
Electron beam lithography
Gaithersburg
Maryland
National Institute of Standards and Technology
International System of Units

7-Monolithic_Silicon_Wafer.pdf

Add to Reading List

Source URL: www.nist.gov

Download Document from Source Website

File Size: 407,94 KB

Share Document on Facebook

Similar Documents

APPLICATION NOTE PL ASMONICS Nanoscribe’s Photonic Professional GT system is the world’s highest resolution 3D printer. It offers resolution between what can be achieved with electron beam lithography and UV lithogra

DocID: 1rveI - View Document

Chemistry / Materials science / Electromagnetic radiation / Microtechnology / Photolithography / Nanolithography / Photoresist / Electron-beam lithography / Mask / Ultraviolet / Resist / Atomic-force microscopy

Journal of Photochemistry and Photobiology A: Chemistry–154 Nanopatterning with conformable phase masks Joana Maria a , Seokwoo Jeon a , John A. Rogers a,b,∗ a

DocID: 1r33C - View Document

Silicones / Thin films / Soft lithography / Display technology / Emerging technologies / Microtechnology / PDMS stamp / Polydimethylsiloxane / Self-assembled monolayer / Nanotransfer printing / Photolithography / Electron beam physical vapor deposition

Langmuir 2004, 20, Improved Surface Chemistries, Thin Film Deposition Techniques, and Stamp Designs for Nanotransfer Printing

DocID: 1pgAS - View Document

Materials science / Microtechnology / Polymers / Semiconductor device fabrication / X-ray lithography / Photolithography / LIGA / SU-8 photoresist / Photoresist / Nanolithography / Beamline / Electron-beam lithography

Soft X-Ray Lithography for High-Aspect Ratio Sub-Micrometer Structures S. Lemkea, J. Goettertb*, T. Holubeka, B. Löchela, I. Rudolpha and T. Seligera a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH,

DocID: 1oTod - View Document

Fraunhofer Institute for Telecommunications / Fraunhofer Society / Telecommunications engineering / Electron-beam lithography / Nanolithography / Fib

Nanofabrication with RAITH EBL and FIB equipment Satellite Workshop - ImagineNano 2015 Conference, Bilbao / Spain Bilbao Exhibition Centre Tuesday, 10th March 2015 from 15:00 to 18:30

DocID: 1mAw0 - View Document