Back to Results
First PageMeta Content



Control of the Receding Meniscus in Immersion Lithography H. Burnett, T. Shedd,∗ G. Nellis, M. El-Morsi, and R. Engelstad Computational Mechanics Center, University of Wisconsin, 1513 University Ave., Madison, WI 53706
Add to Reading List

Document Date: 2005-08-10 21:14:02

Open Document

File Size: 681,44 KB

Share Result on Facebook

City

Madison / New York / /

Company

Kodak Research Labs / SEMATECH Inc. / /

Country

United States / /

/

Facility

mm square / University Ave. / Carnegie Mellon University / University of Wisconsin / University of Wisconsin-Madison / /

IndustryTerm

lens cleaning solution / /

Organization

Carnegie Mellon University / Pittsburgh / Immersion Lithography H. Burnett / T. Shedd / ∗ G. Nellis / M. El-Morsi / and R. Engelstad Computational Mechanics Center / NASA National Center for Microgravity Research / University of Wisconsin / /

Person

A. Grenville / S. Weinstein / C. Van Peski / Eq / E. Rame / /

/

Position

engineering model / /

ProvinceOrState

Wisconsin / New York / Pennsylvania / /

Technology

fluid dynamics / Lithography / simulation / /

SocialTag