Atomic Layer Deposition (ALD) Process Solutions from MKS Instruments

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Date: 2011-10-14 10:03:01 Thin film deposition Agile software development MKS Integrity Software project management Thin film Calibration Pressure measurement Atomic layer deposition Measurement Technology Software development		Atomic Layer Deposition (ALD) Process Solutions from MKS Instruments Add to Reading List Source URL: www.mksinst.com Download Document from Source Website File Size: 1,10 MB Share Document on Facebook

	KNMF Laboratory for Micro- and Nanostructuring Atomic-Layer-Deposition (ALD) The full-fledged research atomic-layer-deposition (ALD) system, model Picosun SUNALE R-200 Advanced, is featuring a hot wall DocID: 1uBFb - View Document
	Journal of Undergraduate Research 7, Atomic Layer Deposition of Zirconium Oxide on Copper Patterned Silicon Substrate Jaya Parulekar Department of Chemical and Biological Engineering, Illinois Institute of DocID: 1sBp0 - View Document
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	Journal of Undergraduate Research 2, Atomic Layer Deposition of Hafnium Oxide on Silicon and Polymer Fibers at Temperatures below 100◦ C K.C. Kragh Department of Physics and Optical Engineering, Rose-Hulman I DocID: 1rFVW - View Document
	LETTER pubs.acs.org/NanoLett Robust, Functional Nanocrystal Solids by Infilling with Atomic Layer Deposition Yao Liu,†,‡ Markelle Gibbs,†,‡ Craig L. Perkins,§ Jason Tolentino,† Mohammad H. Zarghami,†,‡ DocID: 1ryXq - View Document