Reactive High Power Impulse Magnetron Sputtering of Metal Oxides

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Date: 2013-04-18 04:38:29 Chemistry Semiconductor device fabrication Plasma processing Sputter deposition Manufacturing Sputtering Chemical engineering Thin film Coatings Materials science Thin film deposition		Reactive High Power Impulse Magnetron Sputtering of Metal Oxides Add to Reading List Source URL: liu.diva-portal.org Download Document from Source Website File Size: 845,86 KB Share Document on Facebook

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