<--- Back to Details
First PageDocument Content
Semiconductor device fabrication / Chemistry / Ion source / Plasma / Inductively coupled plasma / Helicon / Electrodeless plasma excitation / Plasma source / Plasma physics / Physics / Plasma processing
Date: 2013-09-24 14:58:06
Semiconductor device fabrication
Chemistry
Ion source
Plasma
Inductively coupled plasma
Helicon
Electrodeless plasma excitation
Plasma source
Plasma physics
Physics
Plasma processing

llllllIllllllllllllllllllllllllllllllllllllllllllllllllllllllllllllllllllll US005587038A United States Patent[removed]]

Add to Reading List

Source URL: www.pppl.gov

Download Document from Source Website

File Size: 1,19 MB

Share Document on Facebook

Similar Documents

PHYSICAL REVIEW SPECIAL TOPICS - ACCELERATORS AND BEAMS, VOLUME 7, Plasma density transition trapping as a possible high-brightness electron beam source M. C. Thompson* and J. B. Rosenzweig Department of P

DocID: 1uMVl - View Document

3344 IEEE TRANSACTIONS ON PLASMA SCIENCE, VOL. 43, NO. 9, SEPTEMBER 2015 Investigating Radial Wire Array Z -Pinches as a Compact X-Ray Source on the Saturn Generator

DocID: 1ubl9 - View Document

HeatWave Labs, Inc. TB-173 HeatWave Labs, Inc. Plasma Electron Source The HWPES-250 is a high current, hollow cathode device that can deliver precisely controlled electron currents into plasma environments including corr

DocID: 1tPtI - View Document

Plasma External Lamp (PEL) Source VALUE Extremely high outputs (AM0 or AM1) with single lamp input to most HELIOS HSA Spheres 250W source for addition to HELIOS Systems HELIOS Systems and HELIOSense Software enables (3)

DocID: 1to8o - View Document

PLASMA NOVACUT 41 A new Plasma Cutting compact machine for many applications The power source NOVACUT 41 is a new generation

DocID: 1rKBL - View Document