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Rinse / Chemistry / Piranha solution / Sink / Materials science / Semiconductor device fabrication / RCA clean / Wafer


Marvell NanoLab Member login Lab Manual Contents
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Document Date: 2011-10-17 15:25:44


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File Size: 325,33 KB

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City

Bath / /

Company

EPO / Important Operational Notes Metal / RCA / /

Event

Product Issues / /

Facility

QRD station / FURNACE CLEANED WAFERS TO THE FURNACE STATION / SRD station / Each QDR station / QDR station / /

IndustryTerm

metal tweezers / chemical baths / metal / designated chemical storage cabinet / clean processing / chemical/gas vaults / chemical / nitrile gloves/chemical-resistant gloves/poly / dryer equipment / chemical-resistant gloves / chemical bottle / chemicals / /

Organization

Revision History Chapter / /

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Position

General / CONTROLLER / /

Product

cassette bin / parts / part / /

Technology

alpha / msink6 Protocol / /

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